EUV technology is still immature, Intel and Samsung encounter obstacles in 7nm
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Although TSMC, the process maniac, keeps talking about 7nm/5nm/3nm, a realistic problem is that the key technology or equipment EUV (extreme ultraviolet lithography) lithography machine used for chip production below 10nm still faces many commercial problems. At the annual meeting of the International Society for Optoelectronic Engineering (SPIE) held in California yesterday, experts from Samsung and Intel admitted the difficulties in advancing EUV. Samsung said that they produced the first EUV mask at the end of last year, and there were very few defects. Intel has been developing since 1992, and shipped its first commercial-quality EUV mask to the wafer factory at the end of last year. It has now participated in the production of 14, 10 and 7nm defect-free network cables . Among the existing 8 core EUV plans, 6 plans are ready or about to be ready. Britt Turkot, head of Intel's EUV program, pointed out that the dust-proof film used to cover EUV wafers is still under development, and the new tools for detecting EUV masks are still being verified. However, Samsung said that they still believe that EUV can be used for its 7nm process node, and Intel holds the same view, but said that it needs to wait until it is fully mature before it can be introduced. Currently, ASML of the Netherlands has an 80% share of the highest-end immersion lithography machines, of which the NXE 3350B is the absolute main force among all 14 EUV systems (6 in total), and its unit price is as high as 600 million yuan, which is equivalent to the price of an F35 fighter . Intel is the most senior user of 3350B, but Britt Turkot, an expert in the EUV team, said that although its operating time exceeds 75%, once it is running, mask problems will emerge in an endless stream. As a winner of Toutiao's Qingyun Plan and Baijiahao's Bai+ Plan, the 2019 Baidu Digital Author of the Year, the Baijiahao's Most Popular Author in the Technology Field, the 2019 Sogou Technology and Culture Author, and the 2021 Baijiahao Quarterly Influential Creator, he has won many awards, including the 2013 Sohu Best Industry Media Person, the 2015 China New Media Entrepreneurship Competition Beijing Third Place, the 2015 Guangmang Experience Award, the 2015 China New Media Entrepreneurship Competition Finals Third Place, and the 2018 Baidu Dynamic Annual Powerful Celebrity. |
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